Atomic force microscopy studies of chemical-mechanical processes on silicon(100) surfaces

Journal article

Peer reviewed

R IMOTO, F STEVENS, S. C LANGFORD and J. T DICKINSON

Applied physics. A, Materials science & processing, Vol.94(1), pp.35-43

2009

Handle:

https://hdl.handle.net/2376/100523

Abstract

Solid surfaces and solid-solid interfaces

Exact sciences and technology

Condensed matter: structure, mechanical and thermal properties

Materials science

Surface treatments

Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)

Physics

Surface structure and topography

Cross-disciplinary physics: materials science; rheology

8 Record Views

Title: Atomic force microscopy studies of chemical-mechanical processes on silicon(100) surfaces
Creators: R IMOTO - Physics Department, Washington State University, Pullman, WA 99164-2814, United States
F STEVENS - Physics Department, Washington State University, Pullman, WA 99164-2814, United States
S. C LANGFORD - Physics Department, Washington State University, Pullman, WA 99164-2814, United States
J. T DICKINSON - Physics Department, Washington State University, Pullman, WA 99164-2814, United States
Publication Details: Applied physics. A, Materials science & processing, Vol.94(1), pp.35-43
Academic Unit: Physics and Astronomy, Department of
Publisher: Springer; Heidelberg
Identifiers: 99900546555501842
Language: English
Resource Type: Journal article