Journal article
Characterization of etch pit formation via the Everson-etching method on CdZnTe crystal surfaces from the bulk to the nanoscale
Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, Vol.652(1), pp.178-182
2011
Handle:
https://hdl.handle.net/2376/116059
Abstract
A combination of atomic force microscopy, optical microscopy, and mass spectrometry was employed to study CdZnTe crystal surface and used etchant solution following exposure of the CdZnTe crystal to the Everson etch solution. We discuss the results of these studies in relationship to the initial surface preparation methods, the performance of the crystals as radiation spectrometers, the observed etch pit densities, and the chemical mechanism of surface etching. Our results show that the surface features that are exposed to etchants result from interactions with the chemical components of the etchants as well as pre-existing mechanical polishing.
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Details
- Title
- Characterization of etch pit formation via the Everson-etching method on CdZnTe crystal surfaces from the bulk to the nanoscale
- Creators
- Lucile C Teague - Savannah River National Laboratory, Aiken, SC 29808, USAMartine C Duff - Savannah River National Laboratory, Aiken, SC 29808, USAJames R Cadieux - Savannah River National Laboratory, Aiken, SC 29808, USARaji Soundararajan - Center for Materials Research, Washington State University, Pullman, WA 99163, USACharles R Shick - Savannah River National Laboratory, Aiken, SC 29808, USAKelvin G Lynn - Center for Materials Research, Washington State University, Pullman, WA 99163, USA
- Publication Details
- Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, Vol.652(1), pp.178-182
- Publisher
- Elsevier B.V
- Identifiers
- 99900547575101842
- Language
- English
- Resource Type
- Journal article