Journal article
Enhanced sulfur resistance of Ni/SiO2 catalyst for methanation via the plasma decomposition of nickel precursor
Physical chemistry chemical physics : PCCP, Vol.15(29), pp.12132-12138
08/07/2013
Handle:
https://hdl.handle.net/2376/109673
PMID: 23670520
Abstract
A Ni/SiO2 catalyst was prepared by the plasma decomposition of a nickel precursor via dielectric barrier discharge (DBD). The obtained Ni/SiO2 catalyst shows an enhanced H2S resistance for methanation of syngas (CO + H2). The plasma decomposition has a significant influence on the structural property of Ni/SiO2. The plasma decomposed catalyst shows less defect sites on Ni particles. The formation of Ni-sulfur species was effectively inhibited. The mechanism of H2S poisoning on different catalysts with and without plasma decomposition was also discussed according to the reaction temperature.
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Details
- Title
- Enhanced sulfur resistance of Ni/SiO2 catalyst for methanation via the plasma decomposition of nickel precursor
- Creators
- Xiaoliang Yan - Advanced Nanotechnology Center, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, ChinaYuan LiuBinran ZhaoYong WangChang-jun Liu
- Publication Details
- Physical chemistry chemical physics : PCCP, Vol.15(29), pp.12132-12138
- Academic Unit
- School of Chemical Engineering and Bioengineering
- Publisher
- England
- Identifiers
- 99900547155401842
- Language
- English
- Resource Type
- Journal article