Explosion model applied to an intense pulsed plasma source for thin film deposition

Journal article

P. D PEDROW, K. O GOYAL, R MAHALINGAM and M. A OSMAN

IEEE transactions on plasma science, Vol.25(1), pp.89-96

1997

Handle:

https://hdl.handle.net/2376/115601

Abstract

Physics of gases, plasmas and electric discharges

Plasma applications

Physics of plasmas and electric discharges

Exact sciences and technology

Plasma production and heating

Plasma sources

Physics

12 Record Views

Title: Explosion model applied to an intense pulsed plasma source for thin film deposition
Creators: P. D PEDROW - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164-2752, United States
K. O GOYAL - Watkins-Johnson Company, Scotts Valley, CA 95066, United States
R MAHALINGAM - Department of Chemical Engineering, Washington State University, Pullman, WA 99164-2752, United States
M. A OSMAN - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164-2752, United States
Publication Details: IEEE transactions on plasma science, Vol.25(1), pp.89-96
Academic Unit: Chemical Engineering and Bioengineering, School of; Electrical Engineering and Computer Science, School of; Engineering and Applied Sciences (TRIC), School of
Publisher: Institute of Electrical and Electronics Engineers; New York, NY
Identifiers: 99900548107101842
Language: English
Resource Type: Journal article