Heats of formation of xenon fluorides and the fluxionality of XeF6 from high level electronic structure calculations

Journal article

David A DIXON, Wibe A DE JONG, Kirk A PETERSON, Karl O CHRISTE and Gary J SCHROBILGEN

Journal of the American Chemical Society, Vol.127(24), pp.8627-8634

2005

Handle:

https://hdl.handle.net/2376/105263

PMID: 15954767

Abstract

Molecular properties and interactions with photons

Chemistry

Bond strengths, dissociation energies

Atomic and molecular physics

Properties of molecules and molecular ions

Chemical thermodynamics

Exact sciences and technology

Elements, mineral and organic compounds

General and physical chemistry

Thermodynamic properties

Physics

11 Record Views

Title: Heats of formation of xenon fluorides and the fluxionality of XeF6 from high level electronic structure calculations
Creators: David A DIXON - Department of Chemistry, University of Alabama, Tuscaloosa, Alabama, 35487-0336, United States
Wibe A DE JONG - William R. Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, United States
Kirk A PETERSON - Department of Chemistry, Washington State University, Pullman, Washington 99164-4630, United States
Karl O CHRISTE - Loker Hydrocarbon Research Institute, University of Southern California, University Park, Los Angeles, California 93524, United States
Gary J SCHROBILGEN - Chemistry Department, McMaster University, Hamilton, Ontario, L8S 4M1, Canada
Publication Details: Journal of the American Chemical Society, Vol.127(24), pp.8627-8634
Academic Unit: Chemistry, Department of
Publisher: American Chemical Society; Washington, DC
Identifiers: 99900547178101842
Language: English
Resource Type: Journal article