Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition

Journal article

Kumud O GOYAL, R MAHALINGAM, Patrick D PEDROW and Mohamed A OSMAN

IEEE transactions on plasma science, Vol.29(1), pp.42-50

2001

Handle:

https://hdl.handle.net/2376/102853

Abstract

Physics of gases, plasmas and electric discharges

Plasma applications

Physics of plasmas and electric discharges

Physics

Exact sciences and technology

12 Record Views

Title: Mass transport characteristics in a pulsed plasma enhanced chemical vapor deposition reactor for thin polymer film deposition
Creators: Kumud O GOYAL - Novellus Systems Inc., San Jose, CA, United States
R MAHALINGAM - Department of Chemical Engineering, Washington State University, Pullman, WA 99164, United States
Patrick D PEDROW - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164, United States
Mohamed A OSMAN - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164, United States
Publication Details: IEEE transactions on plasma science, Vol.29(1), pp.42-50
Academic Unit: Electrical Engineering and Computer Science, School of; Engineering and Applied Sciences (TRIC), School of
Publisher: Institute of Electrical and Electronics Engineers; New York, NY
Identifiers: 99900546696101842
Language: English
Resource Type: Journal article