Journal article
Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films
IEEE transactions on plasma science, Vol.28(6), pp.2172-2178
12/2000
Handle:
https://hdl.handle.net/2376/115212
Abstract
A model has been developed to predict the evolution of monomer pressure over time in an inductively coupled plasma reactor. The model uses an analogous electrical circuit to predict preplasma gas flow conditions. Based on the monomer pressure model, a relationship between pressure prior to electrical discharge and the corresponding plasma polymerized acetylene deposition rate was measured experimentally. A plot of measured deposition rate versus preplasma monomer pressure was observed to have a relative maximum.
Metrics
9 Record Views
Details
- Title
- Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films
- Creators
- L.V Shepsis - Dept. of Chem. Eng., Washington State Univ., Pullman, WA, USAP.D PedrowR MahalingamM.A Osman
- Publication Details
- IEEE transactions on plasma science, Vol.28(6), pp.2172-2178
- Academic Unit
- Chemical Engineering and Bioengineering, School of; Electrical Engineering and Computer Science, School of; Engineering and Applied Sciences (TRIC), School of
- Publisher
- IEEE
- Identifiers
- 99900547463401842
- Language
- English
- Resource Type
- Journal article