Plasma-enhanced metal-organic chemical vapor deposition (PEMOCVD) of catalytic coatings for fuel cell reformers

Journal article

Romit DHAR, Patrick D PEDROW, Knona C LIDDELL, Quentin MING, Trevor M MOELLER and Mohamed A OSMAN

IEEE transactions on plasma science, Vol.33(1), pp.138-146

2005

Handle:

https://hdl.handle.net/2376/115482

Abstract

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

Cross-disciplinary physics: materials science; rheology

Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Exact sciences and technology

10 Record Views

Title: Plasma-enhanced metal-organic chemical vapor deposition (PEMOCVD) of catalytic coatings for fuel cell reformers
Creators: Romit DHAR - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164-2752, United States
Patrick D PEDROW - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164-2752, United States
Knona C LIDDELL - Department of Chemical Engineering, Washington State University, Pullman, WA 99164-2710, United States
Quentin MING - InnovaTek, Inc., Richland, WA 99352, United States
Trevor M MOELLER - University of Tennessee Space Institute, Tullahoma, TN 37388, United States
Mohamed A OSMAN - School of Electrical Engineering and Computer Science, Washington State University, Pullman, WA 99164-2752, United States
Publication Details: IEEE transactions on plasma science, Vol.33(1), pp.138-146
Academic Unit: Chemical Engineering and Bioengineering, School of; Electrical Engineering and Computer Science, School of; Engineering and Applied Sciences (TRIC), School of
Publisher: Institute of Electrical and Electronics Engineers; New York, NY
Identifiers: 99900547524701842
Language: English
Resource Type: Journal article